Pfeiffer debuts new range of pumps for R&D work

Vacuum technology supplier Pfeiffer Vacuum has announced a new series of multi-stage pumps for use in electronics R&D.

The Roots pumps ACP 90 have been designed for oil- and particle free applications in the pressure range between atmosphere up to 3x10-2 hPa, Pfeiffer said.

The vacuum pumps meet the requirements for clean and dry vacuum in use cases such as drying, sterilization, coating as well as semiconductor and R&D applications.

According to Pfeiffer, the pumps robust design means they can withstand frequent pump downs, and are resistant to light corrosive gases.

The pumps which fulfills CE and UL/CSA standards, are particularly suited to pumping large amount of condensable gases like in drying applications, high humidity environments or large insulating volume pumping.

Jean-Philippe Briton, product manager at Pfeiffer Vacuum, said: “We are particularly proud of the built-in intelligence that allows for high pumping speed at high pressure, which is important when pumping large volumes.

“With a very low power consumption of 2 kw at atmospheric pressure the ACP 90 is also an energy efficient solution for this type of use.”